Ingredientes para Revlon PhotoReady Candid Natural Finish - Base de maquillaje antipolución

Ingredientes

Revlon PhotoReady CandidÖ Natural Finish, Anti-Pollution Foundation: Aqua/Water/Eau, Cyclopentasiloxane, Dimethicone, Phenyl Trimethicone, PEG-9 Polydimethylsiloxyethyl Dimethicone, Trimethylsiloxysilicate, Butylene Glycol, Polymethylsilsesquioxane, Polysilicone-11, HDI/Trimethylol Hexyllactone Crosspolymer, Aloe Barbadensis Leaf Extract, Aluminum Starch Octenylsuccinate, Camellia Sinensis Leaf Extract, Cucumis Sativus (Cucumber) Fruit Extract, Dimethicone/PEG-10/15 Crosspolymer, Disteardimonium Hectorite, Ethylene Brassylate, Laureth-7, Lecithin, Magnesium Sulfate, Maris Sal/Sea Salt/Sel Marin, , Methicone, Mica, Polyglyceryl-3 Diisostearate, Pullulan, Sclerotium Gum, Silica, Sodium Ascorbyl Phosphate, Sodium Carrageenan, Tetrasodium EDTA, Tocopherol, Tocopheryl Acetate, Triethyl Citrate, Xanthan Gum, Caprylyl Glycol, Phenoxyethanol, Iron Oxides (CI 77491,77492, 77499), Titanium Dioxide (CI 77891)