Ingredients for Revlon PhotoReady Candid Natural Finish, Anti-Pollution Foundation

Ingredients

Revlon PhotoReady CandidÖ Natural Finish, Anti-Pollution Foundation: Aqua/Water/Eau, Cyclopentasiloxane, Dimethicone, Phenyl Trimethicone, PEG-9 Polydimethylsiloxyethyl Dimethicone, Trimethylsiloxysilicate, Butylene Glycol, Polymethylsilsesquioxane, Polysilicone-11, HDI/Trimethylol Hexyllactone Crosspolymer, Aloe Barbadensis Leaf Extract, Aluminum Starch Octenylsuccinate, Camellia Sinensis Leaf Extract, Cucumis Sativus (Cucumber) Fruit Extract, Dimethicone/PEG-10/15 Crosspolymer, Disteardimonium Hectorite, Ethylene Brassylate, Laureth-7, Lecithin, Magnesium Sulfate, Maris Sal/Sea Salt/Sel Marin, , Methicone, Mica, Polyglyceryl-3 Diisostearate, Pullulan, Sclerotium Gum, Silica, Sodium Ascorbyl Phosphate, Sodium Carrageenan, Tetrasodium EDTA, Tocopherol, Tocopheryl Acetate, Triethyl Citrate, Xanthan Gum, Caprylyl Glycol, Phenoxyethanol, Iron Oxides (CI 77491,77492, 77499), Titanium Dioxide (CI 77891)

Details for


Specifications

Form Liquid
Makeup coverage Medium
Makeup finish Natural
Product type Foundation
Quantity Single pack
Skin type Oily